I need to add some precision to the article:
Intel's new 450mm fab will most probably be 10nm-capable or smaller when it starts production in 2015/2016 time frame. What is unsure is if ASML will have Extreme UV equipement by then. If not, Intel will have to adapt current methods (double patterning with standard UV lights) for its move to 10nm with quadruple patterning/multiple exposures. This could extend current manufacturing methods and equipments for a couple more years but the move to shorter wavelengths will have to happen sooner or later. 10nm is possibly the last process node that could be manufactured using standard 193nm UV light.
The move to 450mm is a huge investment at first but will, over time, give a massive advantage to Intel in the world of foundries. Other players will have to follow if they want to stay competitive.